Showing 73–84 of 525 results

  • BiSb Pellets Evaporation Material 3N-6N High Purity Bismuth Antimony Granules Particles for Coating High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BiSb (Bismuth Antimony) Pellets Granules Evaporation Materials

    • High Purity: BiSb pellets are typically available in high purity (99.9% or higher), ensuring the production of high-quality thin films free from contaminants.
    • Thermoelectric Efficiency: The combination of Bismuth and Antimony provides exceptional thermoelectric properties, which is crucial for enhancing energy conversion efficiency in thin films.
    • Uniform Evaporation: The spherical or irregular shape of the pellets allows for even melting and vaporization during the evaporation process, resulting in uniform deposition on substrates.
    • Low Melting Point: BiSb alloys have a relatively low melting point, making them easier to handle in evaporation systems without the need for extreme temperatures.
  • BiSbTe Sputtering Targets 3N-6N High Purity Bismuth Antimony Telluride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BiSbTe (Bismuth Antimony Telluride) Sputtering Targets

    • Excellent Thermoelectric Performance: BiSbTe is known for its high thermoelectric efficiency, which makes it ideal for thermoelectric cooling and energy conversion applications.
    • Wide Temperature Range: BiSbTe thin films perform effectively across a broad range of temperatures, particularly between 200 K and 400 K, making them suitable for various environmental conditions.
    • Customizable Compositions: The composition of BiSbTe sputtering targets can be adjusted by varying the ratio of bismuth, antimony, and tellurium to meet specific thermoelectric performance requirements.
    • High Purity: BiSbTe sputtering targets are available in high-purity grades to ensure the highest quality thin films for critical applications in energy harvesting and temperature regulation.
    • Stable & Durable: Bismuth Antimony Telluride thin films exhibit excellent stability, long-term durability, and resistance to degradation under prolonged thermal cycling.
  • Bismuth Iron Garnet Sputtering Targets 3N-5N High Purity BiIG Bi3Fe5O12 Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized - Tinsan MaterialsBismuth Iron Garnet Sputtering Targets 3N-5N High Purity BiIG Bi3Fe5O12 Ceramic Sputtering Targets High Pure 99.9%-99.999% Customized - Tinsan Materials

    Bismuth Iron Garnet (BiIG / Bi3Fe5O12) Sputtering Targets

    • High Purity: ≥ 99.9% purity ensures high-quality thin films with precise optical and magnetic properties.
    • Superior Magneto-Optical Performance: Provides excellent Faraday rotation and low optical loss.
    • Stable Composition: Chemically stable and reliable for prolonged usage.
    • Customizability: Available in various shapes, sizes, and thicknesses to fit specific sputtering systems.
    • Compatibility: Suitable for both RF and DC magnetron sputtering methods.
  • Bi2O3 Sputtering Targets 3N-5N High Purity Bismuth Oxide Ceramic Sputtering Target High Pure 99.9%-99.999% Customized for Thin Film Applications - Tinsan MaterialsBi2O3 Sputtering Targets 3N-5N High Purity Bismuth Oxide Ceramic Sputtering Target High Pure 99.9%-99.999% Customized for Thin Film Applications - Tinsan Materials

    Bismuth Oxide (Bi₂O₃) Sputtering Targets

    • High Purity: Available in purities up to 99.999% for optimal film quality.
    • Superior Deposition Uniformity: Enables precise and consistent thin-film formation.
    • Thermal Stability: Performs well under high-temperature deposition conditions.
    • Versatile Compatibility: Suitable for various sputtering systems, including DC and RF setups.
  • Bi2Te3 Sputtering Targets 3N-6N High Purity Bismuth Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsBi2Te3 Sputtering Targets 3N-6N High Purity Bismuth Telluride Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan Materials

    Bismuth Telluride (Bi2Te3) Sputtering Targets

    • High Purity: Offers high purity to ensure the quality of thin films and optimal device performance.
    • Excellent Thermoelectric Properties: Ideal for thermoelectric applications where high efficiency is crucial.
    • Uniform Deposition: Provides uniform and stable sputtering, ensuring consistent thin film quality.
    • Thermal Stability: Excellent resistance to heat and thermal cycling, making it suitable for high-temperature applications.
  • BN Pellets Evaporation Materials 2N5-4N High Purity Boron Nitride Granules Particles High Pure 99.5%-99.99% Customized - Tinsan Materials

    BN (Boron Nitride) Pellets Granules Evaporation Materials

    • High Thermal Conductivity: Excellent ability to dissipate heat, ideal for high-temperature applications.
    • Electrical Insulation: Acts as an efficient insulator while maintaining high thermal conductivity.
    • Chemical Stability: Resistant to chemical corrosion, oxidation, and high-temperature degradation.
    • Lubrication Properties: Provides natural lubrication in extreme environments, reducing friction and wear.
    • Customizable Particle Size: Available in various sizes, tailored for specific applications.
  • BN Powder 2N-4N High Purity Boron Nitride Nanopowder Nano Powder Nanoparticles High Pure 99%-99.99% Customized - Tinsan Materials

    BN (Boron Nitride) Powder

    • High Thermal Conductivity: Excellent heat dissipation properties.
    • Electrical Insulation: Exceptional dielectric strength, ideal for electronic applications.
    • Chemical Inertness: Resistant to oxidation and most chemicals.
    • High Purity: Available with ≥99% purity for consistent and reliable performance.
    • Lubricating Properties: Superior lubricity, even at high temperatures.
    • Customizable Particle Sizes: Nano (<100 nm) and micro (1–50 µm) options available or customized.
  • BN Sputtering Targets 3N-6N High Purity Boron Nitride Ceramic Sputtering Target High Pure 99.9%-99.9999% Customized for Thin Film Deposition - Tinsan MaterialsBN Sputtering Targets 3N-6N High Purity Boron Nitride Ceramic Sputtering Target High Pure 99.9%-99.99999% Customized for Thin Film Deposition - Tinsan Materials

    Boron Nitride (BN) Sputtering Targets

    • High Thermal Conductivity: BN targets are ideal for applications requiring effective heat management.
    • Electrical Insulation: Provides excellent dielectric properties, essential for insulating layers in various electronic devices.
    • Chemical Inertness: Highly resistant to most chemicals, ensuring long-term durability in aggressive environments.
    • Easy to Sputter: BN sputtering targets have excellent sputtering properties, ensuring consistent and uniform deposition.
    • High Purity: Available in high-purity grades for precision applications.
  • BST Sputtering Target 3N-6N High Purity Barium Strontium Titanium BaSrTiO3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan MaterialsBST Sputtering Target 3N-6N High Purity Barium Strontium Titanium BaSrTiO3 Ceramic Sputtering Targets High Pure 99.9%-99.9999% Customized - Tinsan Materials

    BST (BaSrTiO3 Barium Strontium Titanium) Sputtering Target

    • High Dielectric Constant: BST has an exceptionally high dielectric constant, which can be adjusted by varying the Ba/Sr ratio, making it ideal for capacitive applications.
    • Tunable Properties: The dielectric constant of BST is voltage-tunable, which is valuable in applications that require adjustable electronic properties, such as tunable filters or phased array antennas.
    • Ferroelectric and Pyroelectric: BST exhibits both ferroelectric and pyroelectric properties, making it useful in memory devices and sensors.
    • Thermal Stability: BST thin films maintain good stability under high temperatures, which is important for applications in electronics and microwave systems.
    • Customizable Composition: The Ba/Sr ratio can be tailored to optimize specific properties, such as tunability, dielectric constant, and thermal stability, for different applications.
  • Carbon Pellets Evaporation Material 4N-7N High Purity C Granules Particles for Coating High Pure 99.99%-99.99999% Customize - Tinsan MaterialsCarbon Pellets Evaporation Material 4N-7N High Purity C Granules Particles for Coating High Pure 99.99%-99.99999% Customized From Tinsan Materials

    C Carbon Graphite Pellets Granules Evaporation Materials

    • High Hardness: Carbon, especially in its diamond-like form, is extremely hard and wear-resistant, making it suitable for protective coatings.
    • High Melting Point: Sublimation point of carbon is around 3,650°C, allowing its use in high-temperature deposition processes.
    • Good Electrical Conductivity: Carbon is conductive, making it suitable for electronic applications.
    • Chemically Inert: Carbon’s chemical stability ensures it remains durable in corrosive environments, enhancing the lifespan of coated materials.
    • Low Coefficient of Friction: Diamond-like carbon (DLC) films offer excellent lubricity and are used to reduce wear in mechanical systems.
  • C Carbon Powder 2N-6N High Purity C Nanopowder Nano Carbon Powder Nanoparticles High Pure 99%-99.9999% Customized - Tinsan Materials

    C Carbon Graphite Powder 6N (99.9999%)

    • High Electrical Conductivity: Especially in the form of graphite, carbon powder is widely used in applications requiring good electrical conduction.
    • Thermal Stability: Carbon is highly resistant to heat and can withstand extreme temperatures, making it ideal for refractory and high-temperature applications.
    • Lubrication: Graphite powder acts as a dry lubricant, reducing wear and friction between moving parts under high temperature conditions.
    • Chemical Inertness: Carbon is resistant to many chemicals, which makes it suitable for use in harsh environments where it will not react or degrade easily.
    • Adsorption: Activated carbon has exceptional adsorption capabilities, making it effective in filtration and environmental clean-up applications.
    • Reinforcement: Carbon black provides strength and durability when added to materials such as rubber and plastics.
  • Carbon Graphite Sputtering Target 99.9%-99.99999% High Purity Carbon C Sputtering Targets 3N-7N Customized - Tinsan MaterialsCarbon Graphite Sputtering Target 99.9%-99.99999% High Purity Carbon C Sputtering Targets 3N-7N Customized - Tinsan Materials

    C Carbon Graphite Sputtering Targets

    • Purity: Graphite sputtering targets are available in high purity (typically 99.9% or higher) to ensure optimal film quality, especially in semiconductor and energy storage applications.
    • High Conductivity: Graphite offers excellent electrical conductivity, making it suitable for thin films in electronic components.
    • Thermal Stability: Graphite can withstand high temperatures, making it ideal for applications in high-heat environments.
    • Chemical Resistance: Graphite is resistant to many chemicals, enabling its use in corrosive environments and protective coatings.
    • Customizable Size and Shape: Available in various forms, such as discs, plates, and custom shapes to fit specific deposition systems.